Equipment of plasma treatment

Abstract

Abstract PURPOSE:To enable obtaining a film of uniform thickness and quality by constituting an electrode of mutually insulated plural conductors and by enabling control of the high frequency power applied to each conductor separately. CONSTITUTION:A cylindrical reaction chamber 1 made of quartz, etc. consists of a body 2 and a lid 3 and the body 2 and the lid 3 can freely be connected or separated. A pair of circular plate lower electrode 5 and upper electrode 10 mutually in parallel is installed in the body 2. The lower electrode 5 is grounded outside the reaction chamber 1 through a supporter 6. The upper electrode 10 has a dual construction of concentric inner electrode 10A and outer electrode 10B electrically separated by an insulator 11. The inner electrode 10A is provided with plural gas supply outlets 13 connected to a gas pipe 12. One end of the output terminals of high frequency oscillators 14A, 14B is connected to the inner electrode 10A or the outer electrode 10B and the other end is grounded.

Inventors

• 👤 Hiroyuki Shida
• 👤 啓之 志田
• 👤 Masakuni Akiba
• 👤 秋葉　政邦

Bibliographic Details