Apparatus for continuous plasma treatment

Abstract

Abstract PURPOSE:To provide a continuous plasma treatment apparatus capable of preventing the generation of plasma discharge excluding the part between the cathode and the anode, by attaching a non-conductive material for preventing plasma discharge to the whole or a part of the inner surface of the vacuum treatment chamber. CONSTITUTION:A non-conductive material for the prevention of plasma discharge, e.g. a fluororesin film 22, is attached to at least a part of the inner surface of the vacuum treatment chamber 1 by baking. The generation of abnormal plasma discharge between the anode 17 and the vacuum treatment chamber 1 can be prevented. Furthermore, the abnormal plasma discharge between the anode 17 and the guide roller 18 can also be prevented by coating the part of the anode 17 opposite to the cathode and the outer surface of the guide roller 18 with said fluororesin film. The unnecessary energy consumption other than the objective plasma discharge treatment can be lowered by this process.

Inventors

• 👤 Masaya Tokai
• 👤 東海　正家
• 👤 Nobuyuki Hiraishi
• 👤 平石　信行
• 👤 Kenichi Kato
• 👤 健一 加藤
• 👤 Susumu Ueno
• 👤 進 上野
• 👤 Koichi Kuroda
• 👤 黒田　幸一
• 👤 Hajime Kitamura
• 👤 肇 北村

Bibliographic Details