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JPS60217624A Expired / Lapsed JP ⏱️ 0.0 years remaining

Manufacture of semiconductor wafer

Assignee: Toshiba Corp
•
Filing: 1984-04-13
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Granted: —
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Expires: 2004-04-13
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Abstract

Abstract PURPOSE:To check to cause deterioration of quality of a wafer main body when a discriminating mark is to be carved by a method wherein the discriminating mark is formed in a bar code type to the peripheral edge part of the wafer according to a rotating grinding blade. CONSTITUTION:An orientation flat 2 is formed on one edge part of a wafer 1, and a slope 3 is formed using a grinding whestone. Then, a discriminating mark 5 is carved in a bar code type along the longitudinal direction of the slope 3 using an extremely thin grinding blade 4. The grinding blade 4 thereof is supported coaxially by a flange 6. The wafer 1 is displayed timely in an arrow mark 8 direction and in an arrow mark 9 direction, and the grinding blade 4 performing a rotation is made to come in contact with the slope 3 to carve the discriminating mark 5. The discriminating mark 5 thereof is consisting of a combination of parallel straight lines, and the discriminating mark is indicated according to the intervals between the straight lines.

Inventors

  • 👤 Nobushi Suzuki
  • 👤 鈴木 悦四
  • 👤 Masaaki Kuniyoshi
  • 👤 国吉 真暁

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-31 22:48
CPC Classifications
H; H10; H10P; H10P95/00; B; B24; B24B; B24B9/00; B24B9/02; B24B9/06; B24B9/065; H10W; H10W46/00; H10W46/101; H10W46/106; H10W46/201

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