Holography device

Abstract

Abstract PURPOSE:To permit easy manufacture of a phase shifter and to reduce the cost of a device by using a film having the columnar structure formed by sputtering or vapor deposition directly on a transparent substrate as the phase shifter. CONSTITUTION:A vapor deposition film 11 formed by direct sputtering or vapor deposition using ZnO as a transparent dielectric on the surface of a grass substrate is used for a phase shifter. The film 11 has the columnar structure in which the C-axis is oriented perpendicularly to the substrate 10 and the random ruggedness thereof acts effectively as a phase shifter in random phase sampling method. The film 11 is etched and the average depth DELTAD of the ruggedness is increased by adjusting the time for etching, by which a satisfactory image is obtd. If the etching is continued for further longer time, an island structure 11' is obtd. and the device is effective for random phase shifter method.

Inventors

• 👤 Yoshitaka Fujii
• 👤 藤井　嘉崇

Bibliographic Details