developer

Abstract

Abstract PURPOSE:To obtain a developing soln. prevented from peeling of patterns, etc., in developing a resist micropattern as the developing soln. for a photo- or ionizing radiation-sensitive 1,2-quinonediazide resin, by adding a very small amt. of org. solvent to an aq. alkaline soln. CONSTITUTION:A developing solution is prepared wherein >=0.05 and less than 1wt% of an org. solvent such as alcohol e.g. methanol or ethanol, ester e.g. ethyl acetate, ketone e.g. acetone, or other org. solvent e.g. tetrahydrofuran is added to an aq. soln. of an inorg. alkali such as NaOH, KOH, Na2CO3, sodium silicate or ammonia, or an org. base such as ethylamine or ethanolamine. The developing soln. thus prepared is used for developing a photoresist of a photosensitive or ionizing radiation-sensitive 1,2-quinonediazide resin, thus permitting a micropattern high in resolution to be obtained by development in forming integrated circuits and preventing the surface layer from peeling, and a thin film from remaining, etc.

Inventors

• 👤 Yoichi Kamoshita
• 👤 鴨志田　洋一
• 👤 Yukihiro Hosaka
• 👤 幸宏 保坂
• 👤 Shinichi Kawamura
• 👤 真一 川村
• 👤 Yoshiyuki Harita
• 👤 榛田　善行

Bibliographic Details