Multistage plasma processor

Abstract

Abstract PURPOSE:To continuously process via various types of plasmas by arranging to elevationally superpose plasma generating chambers attached with vacuum preliminary chambers and elevationally movably holding a cassette which contains wafers at the side of the chambers. CONSTITUTION:Vacuum preliminary chambers 3 are individually attached through intermediate chambers 2 at the side of plasma generating chambers 1. Guide rods 4 are stood at the side of the chambers 3, thereby elevationally movably holding a cassette base for placing wafer containing cassettes 5. A pair of parallel belt conveyors are arranged in the chambers 3. Belt conveyors 34 are arranged at the side, and introduced into notches 7 formed at the base 5 supported by a guide member 4 by moving the conveyor 34.

Inventors

• 👤 Akira Uehara
• 👤 植原　晃
• 👤 Hisashi Nakane
• 👤 中根　久
• 👤 Isamu Hijikata
• 👤 土方　勇

Bibliographic Details