JPS5990852A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Photomask blank
Assignee: HOSAKA GLASS KK
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Filing: 1982-11-16
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Granted: —
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Expires: 2002-11-16
Abstract
Abstract PURPOSE:To enable removal of remaining Cr without requiring overetching at the time of development by raising nitride degree of a CR layer near a substrate in a photomask blank prepared by forming the Cr layer contg. N on the transparent substrate. CONSTITUTION:The photomask is obtained by laminating an N-contg. Cr layer 22 comparatively high in nitride degree and an N-contg. Cr layer 23 comparatively low in nitride degree on a tansparent substrate 10 made of soda lime glass finely polished on the surface. Further, a Cr oxide layer 32 contg. N may be laminated on said Cr layer 23.
Inventors
- 👤 Shigekazu Matsui
- 👤 松井 茂和
- 👤 Kenichi Kagaya
- 👤 加賀谷 健一
- 👤 Masao Ushida
- 👤 正男 牛田
- 👤 Koichi Maruyama
- 👤 光一 丸山
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-09 08:23
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/54; G03F1/58
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