Continuous thin film pattern forming apparatus

Abstract

Abstract PURPOSE:To realize continuous formation of thin film pattern without limitation on material of thin film by continuously transferring both long-length flexible mask material and flexible substrate. CONSTITUTION:A long-length flexible substrate 3 and flexible mask 5 housed in the delivery tank 10 of vacuum vessel 1 are continuously run at a constant speed in the direction of arrow A with driving force of a reel 12 in the receiving tank 16, with the mask 5 laid on the thin film pattern forming surface of the substrate 3 by a guide roller 7. The substrate 3 and mask 5 which are over laid each other and carried into the film forming tank 17 reach the film forming area and are further placed in contact by the mask attaching board 19 and a film is continuously formed on the substrate 3 through the mask 5 by the film forming means 18 such as vacuum deposition, sputtering and plasma CVD. The substrate 3' and mask 5' forming a film pass the guide roller 11 while they are laminated and then respectively wound by the reels 12 and 13 through the guide rollers 14 and 15.

Inventors

• 👤 Kazuo Sunahara
• 👤 砂原　和雄
• 👤 Hiroshi Yokomizo
• 👤 横溝　博
• 👤 Morio Uchida
• 👤 内田　盛男
• 👤 Masanobu Nakamura
• 👤 正信 中村
• 👤 Akira Misumi
• 👤 三角　明

Bibliographic Details