Method for manufacturing substrates for optical equipment

Abstract

Abstract PURPOSE:To obtain a photo detection element array of a large S/N by a method wherein a light shielding mask is pressed on an insulation substrate which transmits a light of a fixed wavelength, via an unhardened adhesive, thus forming a recess of the adhesive in a mask hole. CONSTITUTION:ITO electrodes 22 are arranged at a high density on one surface of a glass plate 21, a photovolatic element 23 of an Si thin film is formed, and a back electrode of an Al film is laid. The photo transmitting adhesive 26 is thickly applied on the surface of the glass plate 21, and the mask 25 having windows corresponding to the electrodes 22 are pressed down, thus making the adhesive swell in projections in the windows. When light is thrown by arranging a movable mask 27, this detection element makes the light incident obliquely reach a fixed clear electrode, while the adhesive layer 26 becomes convex lenses. When reflection surfaces of the masks 25 and 26 are coated with reflection preventing films, the photo detection element array of further higher S/N ration can be obtained.

Inventors

• 👤 Shinichiro Ishihara
• 👤 伸一郎 石原

Bibliographic Details