Detecting method for etching depth

Abstract

Abstract PURPOSE:To detect etching depth automatically and accurately by radiating laser lights to the etching surface of a material to be etched and detecting etching depth by utilizing the reflected light. CONSTITUTION:The material to be etched 3 set on a jig 12 is entered in an etching liquid 2 received in an etching tank 1, and laser lights 5 from a laser oscillator 4 are radiated to the etching surface 6 of the material to be etched 3 from an oblique upper section. Reflected laser lights 7 reflected by the etching surface 6 are detected by a sensor 8 set up to the upper section of the etching tank 1. A glass box 9 is arranged to the surface of the etching liquid 2 to prevent the troubling of the etching surface 6, and the depth of the etching surface is detected more accurately by the sensor 8. The depth of etching is accurately detected automatically by the sensor 8 by utilizing reflected light from the etching surface 6.

Inventors

• 👤 Norihiro Yazaki
• 👤 矢崎　憲弘
• 👤 Akihiko Sato
• 👤 昭彦 佐藤

Bibliographic Details