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JPS5956580A Expired / Lapsed JP ⏱️ 0.0 years remaining

Sputtering method

Assignee: Fujitsu Ltd
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Filing: 1982-09-27
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Granted: —
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Expires: 2002-09-27
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Abstract

Abstract PURPOSE:To improve the utilization efficiency of a target, by circularly arranging plural fixed magnets under the target and by turning a movable magnet in the space among the fixed magnets with an opposite pole upward. CONSTITUTION:Plural fixed magnets 22 are circularly arranged along the edge of an Al target 21 with the south poles upward and the polarity is put in order. The magnets 22 are brought as close as possible to the edge of the target 21. A movable magnet 23 is concentrically turned in the space among the magnets 22 with the north pole upward. A magnetic field is formed with the magnets 22, 23 as shown by the dotted lines, and the target 21 is shaved even at the central part, so the utilization efficiency is considerably improved.

Inventors

  • 👤 Toru Takeuchi
  • 👤 竹内 透
  • 👤 Yukio Katsumata
  • 👤 勝又 幸雄

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-09 06:51
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405; H01J37/3408

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