Magnetron sputtering apparatus

Abstract

Abstract PURPOSE:To make the thickness of a film to be formed on a substrate uniform over a large area, by placing a magnetic body close to the rear side of a target between the peripheral and central magnets of a magnetic device. CONSTITUTION:The titled apparatus is composed of a vacuum vessel 1, an exhaust means to evacuate the vessel 1 to a prescribed pressure, a rectangular flat target 6 put in the vessel 1, a magnetic device installed close to the rear side of the target 6 and consisting of a frame-shaped peripheral magnet 4 along the periphery of the target 6 and a central magnet 9, conveyors 4, 4', 4'' for conveying a substrate over the surface of the target 6 in a direction perpendicular to the major sides of the target 6, a means of supplying gas to the vessel 1, and a power source 14 for applying voltage between the vessel 1 and the target 6. A magnetic body 11 is placed close to the rear side of the target 6 between the magnets 8, 9.

Inventors

• 👤 Katsuhisa Enjoji
• 👤 勝久 円城寺

Bibliographic Details