Plasma treating device

Abstract

Abstract PURPOSE:To facilitate minute processing of a substrate to be treated by integrally connecting a plasma generating chamber and a treating chamber encasing the substrate through a shielding plate with a through-hole and previously providing the treating chamber with a positioning means to the substrate. CONSTITUTION:A sample chamber 1 consisting of a vessel wall 10 with a viewing window 11 for monitoring a sample is placed on a base plate 15 with an exhaust port 2, a base table 7 on which the sample 6 is placed is received in the chamber 1, and a connecting rod 9 projecting from the lower end of the base table 7 is penetrated to the base plate 15 and turned by a motor 8. A photosensor 12 is fitted downward to the ceiling of the treating chamber 1, and the shielding plate 4 with through-holes 5 as nozzles is fitted detachably to the opening section of the ceiling. The plasma generating chamber 3 with a vessel wall 13 is placed on the shielding plate 4, microwaves A are forwarded in the chamber 3 while blowing CF4 and O2 in from a flexible gas introducing pipe 14 drawn into the chamber 3 to generate plasma, and plasma is passed through the through-holes 5 and irradiated on the substrate 6. The position of the base table 7 is regulated simultaneously by the sensor 12.

Inventors

• 👤 Shuzo Fujimura
• 👤 藤村　修三

Bibliographic Details