Manufacture of photo semiconductor device

Abstract

Abstract PURPOSE:To enable to suppress the interval between isolation regions to the minimum by a method wherein two electrode layers and a photo conductor layer formed extending over photo sensitive regions of the plural number are divided by irradiation of an energy beam after the laminate thereof is formed. CONSTITUTION:The transparent electrode layer 2 whose terminal parts 6a-6d are extended is formed on a transparent substrate 1. Then the photo conductor layer 3 is formed in the condition exposing the terminal parts 6a-6d. Then the back electrode 4 is adhered covering the layer 3. At this adhering process, extended parts 5ab-5cd from the layer 4 are connected electrically to the terminal parts 6a-6c. Then the adjoining interval parts 9ab-9cd of the laminate consisting of the layers 2-4 are removed according to irradiation of the laser beam to form the isolation regions 8ab-8cd. Accordingly, the optoelectric conversion regions 7a-7d of the plural number are isolated electrically according to the regions 8ab-8cd. According to this manufacturing method, the interval between isolation regions can be suppressed to the minimum, and utilization efficiency of light can be increased at a solar battery.

Inventors

• 👤 Toshiaki Yokoo
• 👤 横尾　敏昭
• 👤 Takashi Shibuya
• 👤 澁谷　尚
• 👤 Masaru Takeuchi
• 👤 勝 武内

Bibliographic Details