Manufacture of amorphous soft-magnetic thin film

Abstract

Abstract PURPOSE:To produce definite uniaxial magnetic anisotropy in an amorphous soft-magnetic thin film formed by suttering in an arbitrary direction by annealing the thin film in vacuum after applying a DC magnetic field in an arbitrary direction, turning the sample by 90 deg., and annealing it. CONSTITUTION:An amorphous soft-magnetic thin film formed by sputtering is placed in vacuum or an inert gas, and it is subjected to primary annealing after applying a DC magnetic field in an arbitrary direction relatively close to the direction of the axis of easy magnetization. The preferred annealing temp. is about 200-360 deg.C. The sample is turned in the magnetic field by 90 deg. to the direction of the magnetic field, and it is subjected to secondary annealing at about 360-380 deg.C. Thus, an amorphous soft-magnetic thin film having high magnetic permeability and a weak anisotropic magnetic field in the direction of the axis of difficult magnetization is obtd.

Inventors

• 👤 Seizo Kainuma
• 👤 海沼　清三
• 👤 Shinichi Aotsu
• 👤 青津　信一
• 👤 Hidekazu Kachi
• 👤 英一 加地
• 👤 Nobuaki Katou
• 👤 暢昭 加藤

Bibliographic Details