Forming device for thin film

Abstract

Abstract PURPOSE:To provide a forming device for thin film which can form a film by glow discharge decomposition with good reproducibility without receiving limitation in discharge conditions, etc., by providing a means for spectral analysis of the photoluminescence light emitted in the stage of forming the film by the glow discharge. CONSTITUTION:A gaseous raw material (Si(CH3)4+H2) is introduced 32 into a vacuum vessel 31 made of quartz glass. The gas introduced therein is subjected to discharge decomposition by a high-frequency coil 33 to form plasma 34 and to form an SixC1-x:H film 37 on a substrate 36 placed on a susceptor 35 contg. a heater. The forward end of a glass fiber 38 provided through the vessel 31 is placed to face the top of the substrate 36 to make the photoluminescence light excited by the UV region component of the plasma 34 and emitted by the film 37 incident to a spectroscope 39 provided on the outside of the vessel 31. The state of the thin film when said film is formed is detected in real time from the incident result thereof, and the way how the intensity of the emitted light of a required wavelength changes with time is monitored. The formation of the film is stopped at the point of the time when the highest intensity of the emitted light, that is, the thinnest film, is obtd., whereby the film is formed always with good reproducibility under precision control.

Inventors

• 👤 Hiroshi Ito
• 👤 宏 伊東

Bibliographic Details