JPS587831A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Washing method for wafer by high pressured water and device thereof
Assignee: SUMITOMO SHOJI KK
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Filing: 1981-07-07
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Granted: —
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Expires: 2001-07-07
Abstract
Abstract Translated from Japanese (57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。 (57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Inventors
- 👤 Motohiko Tawara
- 👤 田原 元彦
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-10-31 23:29
CPC Classifications
H; H10; H10P; H10P52/00
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
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