Photoelectromotive force element

Abstract

Abstract PURPOSE:To prevent the short-circuit of the titled element by forming a metal film after an insulator has been filled in the pinholes on a thin film which will be generated when an amorphous thin film is formed on a transparent conductive film. CONSTITUTION:The pinholes 6 are filled in by uniformly applying a predefoamed photosensitive insulator 7 of the same color as the amorphous thin film 3 on the film 3 which was formed on a transparent conductive film 2. When a beam of light is irradiated from the side of a glass substrate 1, the film 3 is turned to a mask, and the photosensitive insulator alone in the pinholes are exposed to the light and solidified. A metal film 4 is then formed on the film 3 by performing an etching on the insulator 7. According to this constitution, the short-circuit generating between the transparent conductive film and the metal film can be prevented, and the deterioration of characteristics can also be prevented.

Inventors

• 👤 Kaneo Watanabe
• 👤 渡邉　金雄
• 👤 Hidenori Nishiwaki
• 👤 西脇　秀則
• 👤 Keiichi Enomoto
• 👤 榎本　敬一
• 👤 Michitoshi Onishi
• 👤 大西　三千年
• 👤 Yukinori Kuwano
• 👤 桑野　幸徳

Bibliographic Details