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JPS5874701A Expired / Lapsed JP ⏱️ 0.0 years remaining

Formation of thin polymer film

Assignee: Sekisui Chemical Co Ltd
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Filing: 1981-10-29
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Granted: —
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Expires: 2001-10-29
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Abstract

Abstract PURPOSE:To form a thin polymer film having a high density and high membrane strength on a base film with good adhesion, by coating a cooled base material with a monomer and simultaneously irradiating the material with electron beams in a vacuum tank. CONSTITUTION:A thin, high-density, crosslinked polymer film is formed on a base film 10 by injecting a monomer fed from a cylinder 4 through a slow leak valve 7 and an orifice nozzle 3 against film 10 which is fed from a roll 8, passed around a cooled cylinder drum 11 and taken up by a roll 9, in a vacuum tank 1 evacuated to below about 8 X 10<-4> Torr, to coat the base film with the monomer and at the same time, irradiating the base film with electron beams at above about 5 eV generated from an electron irradiation apparatus 12 (symbol 13 means filament, 14 A.C. source and 15 D.c. source) to polymerize the monomer. It is preferred that the temperature of the cylinder drum is controlled at such a temperature as to provide a vapor pressure of monomer about 1/several time that at 20 deg.C.

Inventors

  • 👤 Masahiro Hotta
  • 👤 堀田 正裕
  • 👤 Takeshi Aragai
  • 👤 新貝 健
  • 👤 Yoshiyuki Fukumoto
  • 👤 福本 義行
  • 👤 Yoji Kono
  • 👤 河野 陽二

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-27 04:12
CPC Classifications
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