Stabilizer for high frequency induction coupling plasma

Abstract

Abstract PURPOSE:To ensure the constant power consumption regardless of the variation in load impedance while enabling a long-time analysis from effect of drift in the matching of the load by controlling the high frequency supply power to keep the difference constant between the incident wave power to the load and the reflected power from therefrom. CONSTITUTION:Output of a high frequency power source 1 is supplied to a load 2 passing through a through type wattmeter 3 which outputs detected values of an incident wave power and an reflected wave power from the load 2, at two output terminals. These detected values undergoes subtraction with a subtraction circuit 4. Outputs of the circuit 4 are applied to a comparator 6 via an amplifier 5 to be compared with a reference signal. Output of the circuit 6 controls the output of the power source 1 while the output of the circuit 6 is controlled to zero.

Inventors

• 👤 Hideo Hattori
• 👤 秀雄 服部
• 👤 Shotaro Asada
• 👤 浅田　庄太郎
• 👤 Koji Okada
• 👤 幸治 岡田

Bibliographic Details