← Back to Patent Explorer
JPS586231A Expired / Lapsed JP ⏱️ 0.0 years remaining

Waste gas disposing device

Assignee: NTT Inc
•
Filing: 1981-07-03
•
Granted: —
•
Expires: 2001-07-03
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract PURPOSE:To obtain a waste gas disposing device that can be connected easily to a device such as a plasma CVD which exhausts poisonous gas without necessitating high temperature and without lowering the capacity of an exhaust system by decomposing the waste gas by plasma discharge. CONSTITUTION:A waste gas disposing device 12, a reaction tank 11 of a plasma CVD device 10 and a vacuum pump 13 are connected by stop valves 5, 7. The valves 5, 7 are opened to let flow only nonpoisonous gas such as H2 out of material gas to regulate atmospheric pressure in the reaction tank 11 and the container 4 of the waste gas diposing device 12. After generating glow discharge between parallel plate-like electrodes provided in the container 4, poisonous waste gas such as SiH4 etc. is introduced into the waste gas disposing device 12 and the waste gas is decomposed by plasma discharge.

Inventors

  • 👤 Toshiaki Kagawa
  • 👤 香川 俊明
  • 👤 Nobuo Matsumoto
  • 👤 信雄 松本

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-31 08:50
CPC Classifications
—

Claims Analysis

Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.

References Cited (Backward Citations)

No citation records indexed.

USPTO Annuity & Maintenance Windows

Maintenance schedule is calculated for granted US utility patents.

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag