Photomask missing defect repair device

Abstract

Abstract PURPOSE:To correct the defect of the photo-mask in high quality by detecting the size of a laser irradiating region and mounting a mechanism which can set a condition optimum for the size. CONSTITUTION:A metallic complex film 4 is formed onto a substrate 1 so as to coat the defect 3 generated to mask patterns 2 shaped by chromium, chromium oxide or these multilayers. Laser beams are irradiated to the film 4, and the precipitated film 6 of a metal, a metal oxide or the mixture is precipitated. A metallic complex of a section not precipitated is removed. Here, a solution obtaind by adding silver nitrate, carboxylic acid and an additive to an organic solvent is used as a metallic complex material. Silver carboxylic acid salt among the silver salt excellently dissolves into the organic solvent, and forms a superior film even when the organic solvent is evaporated.

Inventors

• 👤 Mikio Hongo
• 👤 幹雄 本郷
• 👤 Katsuro Mizukoshi
• 👤 克郎 水越
• 👤 Takeoki Miyauchi
• 👤 宮内　建興
• 👤 Masao Mitani
• 👤 正男 三谷
• 👤 Masaaki Okunaka
• 👤 正昭 奥中
• 👤 Takao Kawanabe
• 👤 川那部　隆夫
• 👤 Isao Tanabe
• 👤 田辺　功

Bibliographic Details