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JPS586124A Expired / Lapsed JP ⏱️ 0.0 years remaining

Semiconductor vapor growth device

Assignee: Shibaura Machine Co Ltd
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Filing: 1981-07-02
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Granted: —
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Expires: 2001-07-02
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Abstract

Abstract PURPOSE:To prevent the clouding and heating of clear glass and to decrease an influence upon a temperature sensor by a method wherein purging gas is flowed into an annular pass provided around the opening of an observation window to wash the inner surface of the clear glass. CONSTITUTION:Purging gas is flowed from a gas leading tube 40 into an annular pass 39 provided around the opening 38 of an observation window 37 and is formed to be almost equal pressure in the circumference direction in the pass 39. The gas is spurted toward the inner surface of clear glass 44 from a gas outlet 46 and flowed so that the inner surface of the glass 44 may be washed out. The inner surface of the glass 44 and a part of the outer surface of a bell jar 26 facing to the inner surface of the glass is kept in clean condition. This permits precise measurement of a temperature sensor 52. The purging gas has an action of cooling the observation window 37. Therefore, heating at the temperature sensor 52 and the holding section can be controlled to the minimum.

Inventors

  • 👤 Kotei Iwata
  • 👤 岩田 公弟
  • 👤 Yoshihiko Miyazaki
  • 👤 宮崎 美彦
  • 👤 Juji Matsunaga
  • 👤 松永 重次
  • 👤 Kichizo Komiyama
  • 👤 吉三 小宮山

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-28 01:31
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/52

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