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JPS5848428A Expired / Lapsed JP ⏱️ 0.0 years remaining

Compound material having carbon film and manufacture therefor

Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1981-09-17
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Granted: —
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Expires: 2001-09-17
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Abstract

Abstract PURPOSE:To obtain a reinforcing material for glass panel and a protective material against mechanical stress by a method wherein carbon having 2.6- 4.5eV or a film having carbon as a principal component is coated on the surface of galss, metal or ceramic. CONSTITUTION:Energy of 0.1-5kW is applied to reactive vapor by electromagnetic energy from a microwave of 2.45GHz and the reactive vapor is activated, decomposed or reacted in an excitation chamber. Furthermore, the reactive vapor is heated at 150-450 deg.C in a reactive furnace 1 by heating furnace 9. Fur thermore, the reactive vapor is reacted and polymerized by high-frequency energy 2 of 13.56MHz to grow the carbon of amorphous sturture forming many C-C bonds. A substrate 10 is heated by a heater 11 through a power source 13 and this reaction product is formed as a film on the surface of the substrate 10. In this way, carbon, especially, carbon containing 25% by mol or less of hydrogen in the carbon and carbon having P, I or N type conductive type is formed on the substrate having a formed face.

Inventors

  • 👤 Shunpei Yamazaki
  • 👤 舜平 山崎

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-30 20:32
CPC Classifications
C; C03; C03C; C03C17/00; C03C17/22; C23; C23C; C23C16/00; C23C16/22; C23C16/26; H; H10; H10D; H10D62/00; H10D62/40; H10D62/402; H10D62/80; H10D62/83; H10P; H10P14/00; H10P14/60; C03C2217/00; C03C2217/20; C03C2217/28; C03C2217/282; C03C2218/00; C03C2218/10; C03C2218/15; C03C2218/152

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