Washing tank

Abstract

Abstract PURPOSE:To improve wasing effect by a method wherein much water is supplied to the base supplied a washing solution and a region requiring the structure of a side wall, and the part requiring no water is constituted to be given a little water concerning a washing tank for washing a semiconductor wafer such as silicon or the like. CONSTITUTION:The drawing shows that width (x) arranging a washed wafer and the apertures of holes 6 located in the range of length (y) are enlarged and the apertures of peripheral sections 7 are narrowed so that much water may be supplied from the surface of the waferr 1. The other drawing is a sectional view showing an example of supplying deionized water from the lateral direction of a washing tank. The deionized water is fed from a suplying port 4 and passes through holes provided at a wall face 51 and is sent to the washing tank 3 and after washing the wafer 1, the deionezed water is overflowed for discharge. In this case, it may be understood that a base plate is installed in the vertical direction as the side face 51 and width (x) is provided in the height direction as shown in the drawing.

Inventors

• 👤 Itaru Yamanaka
• 👤 山仲　格

Bibliographic Details