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JPS5842473A Expired / Lapsed JP ⏱️ 0.0 years remaining

Manufacture of thermal head

Assignee: Semiconductor Energy Laboratory Co Ltd
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Filing: 1981-09-07
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Granted: —
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Expires: 2001-09-07
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Abstract

Abstract PURPOSE:To easily obtain a layer excellent in wear resistance and heat conductivity on the surface of a heating element layer on a base plate by a method in which a reactive gas containing carbon is decomposed by a low-temperature plasma gas phase method to form a carbon-based wear-resistant layer on the heating element layer. CONSTITUTION:On the surface of a heating element layer 3 and an electrode 4 provided on a base plate 1 through a glazed glass layer 2 preferably, a wear- resistant protective layer 5 is formed by low-temperature (100-450 deg.C) plasma gas phase method. In short, a plasma is generated by producing glow or arc discharge by the addition of an electromagnetic energy of DC high-frequency or micro wave under a reduced pressure of 0.01-10 torr to activate and decompose a reactive gas, e.g., such hydrocarbon gases are ethylene, propane, etc., whereby a film made of non-crystalline or semi-noncrystalline insulating carbon or based on a carbon containing 30mol% H and Si is formed.

Inventors

  • 👤 Shunpei Yamazaki
  • 👤 舜平 山崎

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-01 20:23
CPC Classifications
H; H10; H10N; H10N97/00

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