Multilayer structure and manufacture thereof

Abstract

Abstract PURPOSE:To obtain an insulator layer having excellently flat surface and high reliability by forming the interlayer insulator layer of multilayer wires of an insulating material hardened under the specific conditions from a polymer of specific silicon monomer. CONSTITUTION:An interlayer insulator layer of multilayer wires is composed of a mixture of polymer of monomer represented by the formulaeIand II, where R signifies methyl, ethyl, vinyl or phenyl group, and X signifies a halogen, hydroxy or ethoxy group, or an insulating material hardened at a temperature higher than 450 deg.C in an oxidative atmopsphere including oxygen from copolymer of both the monomers. For example, a solution mixed with a mixture of methylphenylpolysilsesquioxane and polydialkoxysilane and methylcellosolve acetate is coated on a metallic wiring layer to form a resin film, which is heated at approx. 500 deg.C in the air, thereby forming an inorganic insulator layer.

Inventors

• 👤 Shiro Takeda
• 👤 武田　志郎
• 👤 Toshisuke Kitakoji
• 👤 北小路　俊右
• 👤 Kyohei Murakawa
• 👤 村川　恭平
• 👤 Minoru Nakajima
• 👤 実 中島

Bibliographic Details