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JPS5825317A Expired / Lapsed JP ⏱️ 0.0 years remaining

Light-insolubilizable resin composition

Assignee: National Institute of Advanced Industrial Science and Technology
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Filing: 1981-08-06
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Granted: —
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Expires: 2001-08-06
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Abstract

Abstract PURPOSE:A light-insolbilizable resin composition showing a high sensitivity at a small amount of photocrosslinkable residues introduced, comprising a light- insolubilizable resin having a specified styryl type nitrogen-containing heterocyclic residue and an acid. CONSTITUTION:A composition comprising a light-insolubilizable resin having at least 0.2mol% styryl type nitrogen-containing heterocyclic residue of formulaI, wherein, R1 is H or alkoxy and Z is an atomic group which forms an aromatic heterocyclic ring, and 0.5-10 molar times, based on the residues contained in the resin, of an organic or inorganic acid. Examples of the heterocyclic ring contained in formulaIinclude those represented by formula II or other rings, and these rings can be substituted with alkyl, alkoxy or hydroxyl groups. When the level of photocrosslinkable residues is below the lower limit, no practical titled composition is obtained, whereas when the level is over, the desirable properties of the resin are adversely affected and the cost becomes high. When the amount of the acid is below the lower limit, a satisfactory effect of improving sensitivity can not be obtained, whereas when it is above the upper limit, an adverse effect results and the properties of the resin are adversely affected.

Inventors

  • 👤 Kunihiro Ichimura
  • 👤 市村国宏

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 00:26
CPC Classifications
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