Sputtering device

Abstract

Abstract PURPOSE:To form an effective magnetic field that induces uniform erosion on a target face by arranging magnets to apply a magnetic field linearly on the target and rotating the magnetic field along the target face. CONSTITUTION:A leg 22 is attached to a circular table 21 and the table is rotated intermittently through the leg 22. Chiplike permanent magnets 23 are arranged on the table 21 in opposition to each other at regular intervals from the center of the table 21 so as to form the magnetic field opposite in polarity. A packing plate 26 on which a target 25 is fixed is provided by keeping a very small clearance between said plate and the table 21. When the table 21 is rotated intermittently, a revolving magnetic field 24 is generated and plasma 27 is concentrated successively over whole area of the target 25 serving as a cathode. Thus, uniform erosion 28 of the target is generated.

Inventors

• 👤 Yasuhisa Sato
• 👤 泰久 佐藤
• 👤 Minoru Inoue
• 👤 実 井上
• 👤 Toru Takeuchi
• 👤 竹内　透

Bibliographic Details