Manufacture of oxide magnetic thin-film

Abstract

Abstract PURPOSE:To form Fe3O4 films, and to shape the oxide thin-film having excellent magnetic characteristics easily by intermittently attaching Fe atoms onto a substrate, controlling the thickness of the Fe atom layers and alternately laminating oxygen atom layers and the atom layers with predetermined thickness. CONSTITUTION:A static shielding mask 2 to which an opening is formed is mounted between an Fe target 1 and the rotary substrate 3 set up to a shaft 4, the substrate 3 is turned and the speed of revolution is controlled, the Fe atoms are attached intermittently onto the substrate 3 and the thickness of the Fe atom layers is controlled. Sputtering is conducted between the target and the substrate 3 while using Fe as the target 1 in the oxidizing atmosphere of the mixed gas of argon Ar and oxygen O2. The oxygen atom layers and the Fe atom layers with the thickness of 1Angstrom -10Angstrom value are alternately laminated at that time, the Fe3O4 films are shaped, and the oxide thin-film having excellent magnetic characteristics is obtained.

Inventors

• 👤 Satoshi Oota
• 👤 聡 太田
• 👤 Yoshiichi Ishii
• 👤 芳一 石井
• 👤 Seiji Hattori
• 👤 服部　誠示
• 👤 Osamu Ishii
• 👤 修 石井

Bibliographic Details