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JPS58106947A Expired / Lapsed JP ⏱️ 0.0 years remaining

Optical sensor

Assignee: Fujitsu Ltd
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Filing: 1981-12-21
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Granted: —
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Expires: 2001-12-21
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Abstract

Abstract PURPOSE:To make a high-luminance spot illumination possible, by incorporating materials, which become a transparent material by oxidation, one, at least, light guiding system for illumination, which is formed into a transparent material by oxidation, in an optical sensor including the light guiding system for illumination and a photodetector. CONSTITUTION:A part of a silicon substrate 8 which becomes a transparent material by oxidation is converted to a silicon dioxide by an anodic oxidation method to form an incident light guiding system 10 which guides an input light 11 to an illumination point 13 on an original surface 9. The incident light 11 is reflected at the illumination point 13, and a reflected light 12 is detected directly or through reflected light guiding systems 10a on both sides of the incident light guiding system by a photodetector 14. Consequently, a spot on the original surface is illuminated with high illuminance, and structures of the illumination system and reflected light guiding systems are made simple and inexpensive.

Inventors

  • 👤 Kiyoshi Ozawa
  • 👤 清 小沢
  • 👤 Nobuyoshi Takagi
  • 👤 高城 信義
  • 👤 Koichi Hiranaka
  • 👤 弘一 平中

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-05 13:46
CPC Classifications
H; H04; H04N; H04N1/00; H04N1/024; H04N1/028; H04N1/03; H04N1/031

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