Method and apparatus for plasma deposition

Abstract

Abstract PURPOSE:To form an amorphous thin film or polycrystalline (amorphous) thin film, having high photo-conductivity, by a method in which a positive electrode is provided between or the periphery of negative electrodes and glow discharge plasma is induced. CONSTITUTION:In a container 23 of quartz tube, etc., kept under reduced pressure, plural negative electrodes 24 and 28 are provided, and a positive electrode 27 is in provided rectangularly between or on the periphery of the negative electrodes 24 and 28. While applying a voltage, raw material gases are sent into the container 23 and glow discharge plasma is induced in magnetic field applied, whereupon a thin film is formed from the decomposition of the raw material gases on a base plate 29 placed on the negative electrode 28. The film film thus obtained has high quality as well as a high photo-conductivity and a low localized level density.

Inventors

• 👤 Takashi Hirao
• 👤 Koshiro Mori
• 👤 Masatoshi Kitagawa
• 👤 Shinichiro Ishihara
• 👤 Masaharu Ono
• 👤 Seiichi Nagata

Bibliographic Details