Sample holder for electron beam exposure

Abstract

Abstract PURPOSE:To prevent accuracy of pattern from lowering by arranging an insulative plate between a sample and a stand and apllying electron beam to the conductive part of the stand and securing the sample on the stand by static electricity. CONSTITUTION:A wafer 15 is housed in a metal cassette 11, and an electron beam is applied to a conductive plate 13b through a penetrating hole 11b. Then electric charge is stored at the capacity composed of the conductive plate 13b-an insulating plate 14-a wafer 15. Because of this, attractive force F is generated. The wafer 15 is attracted to the conductive plate 13b of a push plate 13 and secured at the state without warp. If exposure is done at this state, highly accurate pattern can be obtained. By changing the application time T of the beam, the desired attractive force F can be obtained. With a short circuit of the wafer 15 and the conductive plate 13b after exposure, the stored electric charge is discharged, the attractive force F becomes zero, and the wafer comes off from the plate 13 easily.

Inventors

• 👤 Hideo Kusakabe

Bibliographic Details