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JPS5772369A Expired / Lapsed JP ⏱️ 0.0 years remaining

Semiconductor device building in light receiving element

Assignee: Hitachi Ltd
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Filing: 1980-10-24
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Granted: —
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Expires: 2000-10-24
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Abstract

Abstract PURPOSE:To improve the incident efficiency of light to the light receiving element by forming the light receiving element onto an element shaped to a semiconductor layer so as to cover the element. CONSTITUTION:An NPN type transistor is composed in such a manner that a P type base regon 5, and N<+> type emitter region 6 and an N<+> type ohmic contact region 7 for extracting a collector electrode are diffused and formed. A photodiode 8 as a photocell is shaped to an upper section of the transistor so as to cover the transistor. When the photocell is formed in this manner, light can be projected efficiently into a silicon layer 15 from the surface side.

Inventors

  • 👤 Yasunobu Tanizaki

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-28 21:05
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/18

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

JPS5483386A Cited

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