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JPS5771191A Expired / Lapsed JP ⏱️ 0.0 years remaining

Photosemiconductor element

Assignee: Fujitsu Ltd
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Filing: 1980-10-21
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Granted: —
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Expires: 2000-10-21
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Abstract

Abstract PURPOSE:To obtain a light-emitting element having a big photoconfining effect or a light-receiving element having a big quantum effect by a method wherein a semiconductor layer of a III-V family compound is formed on an InP substrate for making it into a light-emitting element or a light-receiving element, whereby an active layer or a photoabsorptive layer composing it is made of an AlCaInAs layer of a specific composition. CONSTITUTION:When a semiconductor of a III-V family compound is formed on an InP substrate, an AlGaInAs layer capable of making an energy gap 0.73-1.5 eV is used as an active layer or a photoabsorptive layer. Namely the active layer or the photoabsorptive layer is made of an AlxCayIn1-x-yAs layer of 0<x<=0.47, 0>y<=0.47. Further thereon an AluGayIn1-x-yAs layer of 0<u<=0.47, 0<=v<=0.47 having a bigger energy gap than this is laminated as the photoconfining layer or a window layer. Thereby a melt back phenomenon at the making time is eliminated to improve grid matching.

Inventors

  • 👤 Kazuo Nakajima

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-10-29 07:09
CPC Classifications
H; H10; H10F; H10F55/00; H10F55/18

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