Forming method for metallic film pattern

Abstract

Abstract PURPOSE:To obtain a metallic film pattern by employing selectively removable two types of photoresists or selectively etchable photosensitive resin, thereby readily forming a life-off pattern. CONSTITUTION:After a resists 8 is rotatably coated on a substrate 9 and is then dried, a mask 10 is used to expose and develop at 11. After it is baked at a temperature of the removable degree, another resist 13 is rotatably coated, it is exposed and developed with the mask 12 to form a window 14. It is then dipped in acetone to remove the film 11, a metal 15 is deposited, and when it is then lifted off, a metallic pattern 16 having a thickness of beautiful shape can be obtained. According to this method, the life-off pattern can be readily formed without vacuum film forming step.

Inventors

• 👤 Kazuhiko Amemori

Bibliographic Details