Manufacture of amorphous semiconductor film

Abstract

Abstract PURPOSE:To form uniform quality of film at the manufacturing time by providing a gas flow control plate in the vicinity of an exit in a vacuum tank. CONSTITUTION:Since an exit is provided at the position slightly in the vicinity of the outer periphery from the center in a vacuum tank of a plasma CVD device, gas introduced from a shower forms an irregular flow, causing the irregular characteristics of the film as its drawback. In order to eliminate this drawback, a gas flow control plate is provided in the vicinity of the exit. For example, the gas flow control plate 13 is provided on the exit 36, various types of control plates 37 with holes are formed, the control plate adapted form the gas flow rate is used to obtain a uniform gas flow, thereby reducing the irregular thickness of the film and equalizing the discharging state.

Inventors

• 👤 Kuniharu Yamada

Bibliographic Details