Manufacture of semiconductor device

Abstract

Abstract PURPOSE:To remove influences by dust on a mask by a method wherein the mask is shifted and exposed to lights twice through a photomask having etching patterns which have repeats in numbers excess by one or more than necessary numbers. CONSTITUTION:The photomask 1 composed of a white part 2 penetrated by lights and a part 3 shutting off the lights coming in is formed so as to have parts of the patterns 4, 5 which have the repeats in numbers excess by one or more against a pattern 6 having a plurality of te repeats in the central part, and after the first time light sensitive pattern is formed on a light sensitive resin by the photomask, the mask is exposed to lights for the second time repeatedly shifted as much as the part of the pattern and developed. Whereby the influences by dust on the mask are removed without washing the mask and the semiconductor can be manufactured in good yield.

Inventors

• 👤 Masaru Yoshino

Bibliographic Details