Formation of pattern

Abstract

Abstract PURPOSE:To form a fine pattern with high accuracy and without causing the breakage of wire or the like by providing a layer preventing a resist from the reflection of light for exposure between a formed substance and the resist. CONSTITUTION:A formed substance 2 having high reflection characteristics such as Al or the like is provided on a substrate 1. And a coating layer 3 consisting of a substance (for example, poly Si or the like) having a small reflectivity or high light absorption is provided on the formed substance 2 surface when exposure is applied by masks 6 by using a photoresist 4. In this way, the irradiated light is absorbed in the layer 3 or multiply reflected. Therefore, regions 5 not to be exposed will not undesirably exposed and a fine pattern will be obtained with high accuracy.

Inventors

• 👤 Nobuhiro Endo
• 👤 Kazuo Kamimura

Bibliographic Details