Manufacture of semiconductor element

Abstract

Abstract PURPOSE:To prevent a pinhole from arising and also to obtain a fine opening by providing a window of the second photoresist with its one part placed upon a window of the first photoresist. CONSTITUTION:A resist film 3 is provided on a substrate having SiO2 film 2, and a square window 4 4mum per side is formed. Then, the second resist film 5 is placed thereon, and the square second window 6 4mum per side is formed. The window 6 is formed, in this case, by shifting it 2mum each to the window 4 in both X and Y directions, thereby forming a window 8 on the part overlapped. The window 8 is a square 2mum per side. According to this method, each side of the windows 4, 6 is too long to form a circular arc on the corners, therefore the window 8 has an accurate shape. A fine window 7 can be opened from etching SiO2 film 2 according to the window 8.

Inventors

• 👤 Shuji Tabuchi

Bibliographic Details