Positive type photosensitive composition

Abstract

Abstract PURPOSE:To obtain a positive type photosensitive composition superior in sensitivity, and resistance to alcohol, etching, and printing, by using o-quinonediazidesulfonic acid ester of halogenated polyhydroxystyrene. CONSTITUTION:o-Quinonediazidesulfonic acid ester of halogenated polyhydroxystyrene represented by the formula in which X is a halogen atom is used as a photosensitive agent. A photosensitive solution prepared by dissolving said photosensitive agent together with a dye, colorant, plasticizer, and/or the like according to uses, is coated on a substrate, such as an aluminum plate for printing, imagewise exposed, and developed with an aqueous alkaline solution. A printing plate is obtained by rubbing the plate face with absorbent cotton wetted with water containing isopropyl alcohol. This printing plate is not affected by printing using a damping water containing isopropyl alcohol, and it has high printing resistance. o-Quinonediazidesulfonic acid ester of a novolak type phenol resin and an alkali-soluble resin may be added to said photosensitive composition.

Inventors

• 👤 Takateru Asano
• 👤 Yoko Matsumoto

Bibliographic Details