Method of exposing electron beam

Abstract

Abstract PURPOSE:To eliminate the affection of both linearities of a large section deflecting systen precise D/A converter and a small section deflecting system high speed D/A converter in a method of exposing an electron beam and accurately draw an infinitesimal figure bridged over reference regions by aligning the high speed D/A converter with the precise D/A converter. CONSTITUTION:Marks m1-m3 are attached to the vicinity of the reference sections A1, T1 and A20 on a specimen 5. When specifying the position of the mark m1, a computer 10 deflects the large sections by a deflector 7 through an information transmission mechanism HSC8 and a high accuracy D/A converter 14 until detecting it by a detector 23. When specifying then the mark m2, the first , third and fifth bits of the most significant bit of the D/A converter 14 are turned on and horizontally deflected to transmit signals through the D/A converter 27 from the mechanism HSC8 until detecting the mark m2 so as to control the amplification gain 15. Subsequently, only the fifth bit of the D/A converter 14 is turned off, and the electron beam is returned to the position P0. Then, the D/A converter 14 is turned on at the first bit of the converter in the present state to control the amplification gain 13 by the controller 26 until detecting the mark m2 and to deflect the small section by the deflector 6. When the linearities of the large and small sections are aligned in the deflecting systems 6 and 7 at the maximum point P0 of the deflecting width, it can be similarly operated in a direction Y also with the marks m1 and m2. As a result, the infinitesimal figure is not deformed over the two reference regions.

Inventors

• 👤 Hidekazu Goto
• 👤 Takashi Soma
• 👤 Masanori Idesawa
• 👤 Kazumitsu Tanaka

Bibliographic Details