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JPS562126A Expired / Lapsed JP ⏱️ 0.0 years remaining

Method and apparatus for manufacturing polymer film

Assignee: Teijin Ltd
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Filing: 1979-06-20
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Granted: —
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Expires: 1999-06-20
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Abstract

Abstract PURPOSE:To prevent the adhesion of a sublimate generated from a film surface before cooling onto a moving cooling surface of a film extruded by a mechanism wherein an electrostatic dust collecting means is provided between a die orifice and the moving cooling surface. CONSTITUTION:A sublimate dust collecting means formed by combining a discharge electrode 1 for applying voltage (preferably, negative voltage) by means of a high-tension power source 3 and a gutter-shaped dust collecting electrode 2 is installed between a die orifice 5 and a moving cooling surface 6. In the said device, a melted film 7 discharged from the die orifice 5 is fast stuck onto the moving cooling surface 6 rotating in the arrow head direction by means of a closely adhering means 8 as electrostatic peening for applying voltage by means of a power source 4 and cooled, but a sublimate generated from the film 7 until the film is cooled is charged by means of the discharge electrode 1, adsorbed to the dust collecting electrode 2, and removed, thus preventing adhesion onto the moving cooling surface 6.

Inventors

  • 👤 Toshifumi Osawa
  • 👤 Norio Takagi
  • 👤 Hiroshi Aoyanagi
  • 👤 Haruhiko Mizumori

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-01 19:32
CPC Classifications
B; B29; B29C; B29C48/00; B29C48/25; B29C48/88; B29C48/911; B29C48/9135; B29C48/915; B29C48/9165; B29C48/03; B29C48/07; B29C48/08; B29C48/914

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