Manufacture of photomask

Abstract

Abstract PURPOSE:To obtain a photomask with high accuracy by making chips of different patterns about equal in plane size and forming two or more kinds of chip patterns on one reticle to make reticle exchange unnecessary in projection exposure and prevent pattern disagreement between chips. CONSTITUTION:In a process of manufacturing photomask 11 having two or more kinds of chip patterns 12, 13, patterns 12, 13 are made equal in size, and reticles 14, 15 having 10-time size are formed on the same reticle 16 as one pair. Reticle 16 is set in a photorepeater, and the feed extent of the repeater is regulated to size l of one chip pattern. One chip pattern 15 is first shielded, and the other chip patterns 12 alone are successively projected on a photomask and exposed at step feed extent l. Similar processing is then carried out to make reticle exchange unnecessary.

Inventors

• 👤 Kazuhiko Tsuji
• 👤 Shuji Kondo

Bibliographic Details