Exposure method

Abstract

Abstract PURPOSE:To prevent erroneous confirmation of the focus, by using the S polarized light parallel with the face to be exposed as the light source for adjusting the focus. CONSTITUTION:Light emitting device 2 and photodetector 3 are provided on the outside face of mirror cylinder 1 of the exposure device. Focus adjusting light 4 emitted from light emitting device 2 passes through polarizing filter 11 and becomes the S polarized light and is incident to the surface of photoresist film 7, which is caused to adhere onto semiconductor substrate 6, through mirror 5 at prescribed angle (i). Since the incident light is the S polarized light, most of it is reflected by the surface of film 7, and the light quantity is considerably larger than the reflection light quantity from aluminum layer 10 under film 7. These reflection lights are received by photodetector 3 through mirror 8, thus performing focus adjustment.

Inventors

• 👤 Masao Kanazawa

Bibliographic Details