Electrophotographic photosensitive material

Abstract

Abstract PURPOSE: To improve abrasion resistance of the title material, by forming on a photoconductive layer a protective layer consisting of a composition of a silane coupling agent hydrolyzate and a cellulosic resin. CONSTITUTION: Water or alcohol containing acid is added to a silane coupling agent, such as methyltrimethoxysilane or tetraethoxysilane to hydrolyze this. To the partial hydrolyzate is added to a cellulosic resin in an amount of 1W50wt% represented by the formula (R is H, 1W4C alkyl, aryl, hydroxyethyl, benzyl, nitro, or a phosphoric acid radical, and n is 50W5000). A curing catalyst, such as carboxylic acid metal salts or organic tin compounds is further added, the obtained composition is coated on a photoconductive surface and dried at room temperature to about 150°C to form a 0.1W10μ thick protective film. This film permits abrasion resistance of the photosensitive material to be remarkably improved and about 30,000 sheets of sharp copies to be made. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Masaru Shimada
• 👤 Hideaki Ema
• 👤 Hiroshi Tamura
• 👤 Tetsushi Otomura

Bibliographic Details