Cvd device

Abstract

Abstract PURPOSE:To obtain a homogeneous and stable film on a wafer by a construction wherein the wafer is loaded on the holder whose diameter is smaller than that of wafer for reducing the effect of fluttering of flake from the suscepter's. CONSTITUTION:A circular holder 12 which is a little smaller in diameter than wafer 12 is furnished on the suscepter 2. Each holder is made of material that has large heat capacity and loaded with wafer or dummy to protect the surface. By this construction of the CVD device, the fluttering flake from suscepter 2 is reduced very much and moreover the good temperature pattern is obtained because of freedom from foreign material at the contact between wafer and holder 12. Futhermore less frequent suscepter cleaning is to be required because of less interference to wafer of suscepter's flakes. By this necessary and simple maintenance, the wafer of high quality and high yield is obtained.

Inventors

• 👤 Toshiyuki Tashiro

Bibliographic Details