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JPS5594955A Expired / Lapsed JP ⏱️ 0.0 years remaining

Film-forming coating solution

Assignee: Hitachi Ltd
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Filing: 1979-01-12
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Granted: —
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Expires: 1999-01-12
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Abstract

Abstract PURPOSE: To provide a film-forming coating solution having low melting point and a good workability by a method wherein a water-insoluble solvent having soecified melting and boiling points is added to a ladder organosilicone polymer having phenyl gp. and o-dimethoxybenzene. CONSTITUTION: A film-forming coating solution consists of (A) polyphenylsilsesquioxane of the formula or a ladder organozilicone polymer essentially consisting of basic structural unit of above polymer and a mixed solvent consisting of (B) 50W99wt% of o-dimethoxybenzene and (C) 1W50wt% of a water-insolble solvent with m.p. of 20°C or lower and b.p. of 185W225°C. (C) is added to compensate insufficient solubility and film-forming property at room temperature of (B) whose m.p. is 22.5°C. As (C), water-insoluble solvent having above described m.p. and b.p. is preferably used. COPYRIGHT: (C)1980,JPO&Japio

Inventors

  • 👤 Takeshi Watanabe
  • 👤 Ryoichi Sudo
  • 👤 Fusaji Shoji
  • 👤 Ataru Yokono
  • 👤 Tokio Isogai

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-02 00:15
CPC Classifications
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