Diffusion furnace temperature controller

Abstract

Abstract PURPOSE: To provide a high accuracy temperature controling method in the control of temperature in a diffusion furnace for semiconductor production by a method wherein thermocouples are installed at the heater around furnace core pipe and at a point near the core pipe, with detected temperatures and their difference being used to calculate core pipe temperature. CONSTITUTION: A first thermocouple 4 is installed at B area of cylindrical resistance heater 2 surrounding furnace core pipe 1. A second thermocouple 5 is provided at C area which is close to the core pipe 1. Temperatures T 1 and T 2 detected by both thermocouples are sent to the temperature controller 9, which calculates the temperature in the core pipe, from the radial temperature gradient including the heater and pipe, T 1 -T 2 , and either T 1 or T 2 . The power supply 7 is controlled to supply power to the heater 2 so that the difference between the calculated temperature and the set value for the furnace becomes zero in accordance with the required response characteristic. COPYRIGHT: (C)1980,JPO&Japio

Inventors

• 👤 Takayuki Ogoshi
• 👤 Takashi Tanaka

Bibliographic Details