← Back to Patent Explorer
JPS5585209A Expired / Lapsed JP ⏱️ 0.0 years remaining

Inspection device for mask

Assignee: Hitachi Ltd
•
Filing: 1978-12-22
•
Granted: —
•
Expires: 1998-12-22
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract PURPOSE: To detect the defect of a mask instantaneously by projecting light from one side to the inside of the mask and by making the faulty part glitter on the surface of the mask on utilizing the diffused reflection which occurs only in the faulty part. CONSTITUTION: When the light projected from one side of the inside of the photomask passes through the glass plate 18 by the total reflection and emerges from the other side, no light is detected even when viewed from above as shown in Figure (a), the whole visual field looks dark. When there exists a defect 19, a portion of light projected to the glass plate 18 is diffusely reflected as shown in Figure (b) and the faulty part glitters when viewed from above or below. The presence or absence of the defect can be discriminated by the presence or absence of the diffused reflection of light. COPYRIGHT: (C)1980,JPO&Japio

Inventors

  • 👤 Tamotsu Sasaki
  • 👤 Moriaki Kurimoto

Bibliographic Details

Application Number —
Jurisdiction JP
Data Source google_patents
Last Synchronized 2026-11-04 01:52
CPC Classifications
—

Claims Analysis

Total Claims: 0
No claims parsed yet. Click Sync Now above to re-index claims from Google Patents.

References Cited (Backward Citations)

JPS4888982A Cited
JPS498292A Cited

USPTO Annuity & Maintenance Windows

Maintenance schedule is calculated for granted US utility patents.

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag